DOI > 10.5291/ILL-DATA.5-54-288

This proposal is publicly available since 06/17/2024

Title

Magnetisation and diffusion depth profiles in ultrathin epitaxial YIG/GGG(111) layers for low-relaxation spin wave applications

Abstract

Epitaxial growth of YIG / GGG (111) films exhibiting atomically flat step-and-terrace surface, sharp and flat interfaces, low coercivity, rectangular magnetization loops and low damping spin wave propagation has been achieved by means of pulsed laser deposition. However, our recent ferromagnetic resonance (FMR) and polarized neutron reflectometry (PNR) experiments have shown a 6 nm thick interface layer between YIG and GGG, suggesting migration of Ga atoms from the substrate across the interface. As seen from FMR, the thickness of this layer increases with the growth temperature indicating temperature-activated mechanism of migration. We propose to further elucidate this issue and explore the mechanisms of Gd and Ga migration by means of PNR. This knowledge is necessary to further optimize the YIG epitaxial growth technology aimed at creation of high-quality ultra-thin YIG layers for spintronics applications.

Experimental Report

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Data Citation

The recommended format for citing this dataset in a research publication is in the following format:

UKLEEV Victor; CHERNYSHOV Dmitry; KOROVIN Alexander; SUKHANOV Aleksandr; SUTURIN Sergey and VOROBIEV Alexei. (2019). Magnetisation and diffusion depth profiles in ultrathin epitaxial YIG/GGG(111) layers for low-relaxation spin wave applications. Institut Laue-Langevin (ILL) doi:10.5291/ILL-DATA.5-54-288

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Metadata

Experiment Parameters

  • Environment temperature

    5-300 K
  • Experiment energy

    5.13 Å
  • Experiment moment

    0.01-0.15 Å-1
  • Experiment res energy

    0.1 Å
  • Experiment res moment

    0.005 Å-1

Sample Parameters

  • Formula

    • Y3Fe5O12/Gd3Ga5O12