Neutron diffraction in epitaxial antiferromagnetic oxide films for application in spintronics : effect of the thickness of the magnetic laye
The search of new antiferromagnetic materials for spintronics is an important issue of this decade. The strains induced by the substrate control the orientation of the orbitals during the film deposition and control the nature and the orientation of the spins in the ordered phase. This control of the orbital ordering allows to fabricate artificial structures with create antiferromagnetic ordering along the c axis (perpendicular to the substrate) of ferromagnetic monolayers with a quite high critical temperature. We propose here to study the influence of the thickness of the magnetic layer of the properties of the magnetic film. The experiment will be to measure one sample on D10 the antiferromagnetic structure at low temperatures (30K) were the magnetic structure is well established. For one sample and based on our previous experience, we ask for 10 days. We need a four circles set up with a displex cryostat and the triple axis option to reduce the background. This experiment will be part of PhD thesis of the PhD program of ILL.
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SIMON Charles; BEAUVOIS Ketty; HIMANSHU Himanshu; LEPETIT Marie Bernadette; MERCEY Bernard; OULADDIAF Bachir and REBOLINI Elisa. (2021). Neutron diffraction in epitaxial antiferromagnetic oxide films for application in spintronics : effect of the thickness of the magnetic laye. Institut Laue-Langevin (ILL) doi:10.5291/ILL-DATA.5-54-371
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