DOI > 10.5291/ILL-DATA.DIR-118

This proposal is publicly available since 06/13/2018

Title

Influence of plasma treatment on low K materials within the framework of the IRT nanoelectronics

Abstract

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Experimental Report

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Data Citation

The recommended format for citing this dataset in a research publication is in the following format:

LEPINAY Matthieu; GUTFREUND Philipp; IMBERT Gregory and SEGURA RUIZ Jaime Alberto. (2013). Influence of plasma treatment on low K materials within the framework of the IRT nanoelectronics. Institut Laue-Langevin (ILL) doi:10.5291/ILL-DATA.DIR-118

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Metadata

Experiment Parameters

  • Environment temperature

    ambient

Sample Parameters

  • Formula

    • SiOCH
    • Cu
    • Ta
    • TaN

  • Consistence

    Polycrystalline

  • Mass

    1

  • Size

    0.1

  • Container

    Sample crystal silicon wafer

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