DOI > 10.5291/ILL-DATA.1-04-145

This proposal is publicly available since 10/17/2023

Title

In situ GISANS study on the electrodeposition of bismuth telluride on titanium nitride from non-aqueous solution.

Abstract

Bismuth telluride films on titanium nitride substrates have been electrodeposited in our lab from a non-aqueous electrolyte based on dichloromethane. The particle density on the substrate surface, their shape and size distribution depends on the applied deposition potential and time. In principle, it should be possible to deposit the material with a high density of nuclei at the beginning, followed by a uniform particle growth. The proposed GISANS experiment aims at investigating the nucleation process of bismuth telluride on titanium nitride during electrodeposition, by exploiting the evanescent wave of neutrons in total reflection through the back of the sample, which allows for the monitoring of nucleation and growth inside a closed electrochemical cell by precisely tuning the neutron penetration depth.

Experimental Report

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Data Citation

The recommended format for citing this dataset in a research publication is in the following format:

MOEHL Gilles Ernest; CUBITT Robert; Samuel D. S. Fitch and HECTOR Andrew. (2018). In situ GISANS study on the electrodeposition of bismuth telluride on titanium nitride from non-aqueous solution.. Institut Laue-Langevin (ILL) doi:10.5291/ILL-DATA.1-04-145

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Metadata

Experiment Parameters

  • Environment temperature

    room temperature

Sample Parameters

  • Formula

    • TiN on Si wafer